Successful development of a new photoresist preparation method, followed by a review of photoresist-related companies.

According to China Chemical Industry News, an international cooperation team led by Associate Professor Zhuang Liwei from East China University of Science and Technology and Professor Michael Sapers from Johns Hopkins University in the United States, have proposed a method for preparing amorphous zeolite imidazole ester framework thin films using intermittent spin coating chemical liquid phase deposition. This method achieves controllable deposition rate and thickness of the films, and has been validated by electron beam lithography and extreme ultraviolet lithography. The related research was recently published in Nature - Chemical Engineering. In recent years, aZIF thin films have been used as advanced photoresists. Achieving large-area, high-precision controllable preparation of aZIF thin films is of great significance for advanced photoresist processes in related fields. Building on the previous strategy of preparing aZIF thin films by super dilute precursor solution empowered chemical liquid phase deposition method, the research team has proposed a new method for preparing aZIF thin films. According to the company's business operations and disclosures on their investor relations interactive platform, there are 20 companies listed on the A-share market that are involved in the layout of semiconductor photoresist business, including Shanghai XinYang, Nanda Optoelectronics, and Polyoptics Technology. These companies include both upstream and downstream companies in the semiconductor industry chain, as well as subsidiaries or investee companies participating in the semiconductor photoresist business.