Shanghai AI Laboratory team overcomes the difficult problem of stable preparation of photoresist for core materials in chips.

The official WeChat account of Shanghai Artificial Intelligence Lab recently announced that photoresist, as one of the core materials for chip manufacturing, directly affects the performance and yield of chips. Leveraging the overall deployment of the 2030 New Generation Artificial Intelligence National Key Science and Technology Major Project, Shanghai Artificial Intelligence Laboratory, in collaboration with Xiamen University, Suzhou National Laboratory, and other cooperative units, based on the "Shusheng" scientific large model and "Shusheng" scientific discovery platform, has constructed a closed-loop R&D system of "AI decision-making + automated synthesis", achieving the creation of high-purity, high-consistency, and high-efficiency KrF photoresist resin. This breakthrough no longer relies on the "black box capability" of a few foreign suppliers for stable preparation of high-end photoresist resin, exploring a standardized and rapidly iterative new path in the global chip material field. Currently, the platform has supported multiple batches of automated synthesis and performance verification, significantly improving batch-to-batch consistency. Xiamen Hengkun New Materials Technology Co., Ltd., based on their experience in developing photoresist formulations, has completed resin adaptation, with all industry key indicators meeting expectations, and will enter the customer verification phase in the future.